Figure 3

Cell Retention Relative to Patterning and Shear Stress. Average cell count per 400 μm × 400 μm unit pattern area, ±1.0σ. Across +Glass, +Si, and PMMA surfaces, cells were counted within a four grid overlay of size equivalent to that of the etched nanowell array. Note: under static condition, patterning is non-directional on account of no flow. * indicates significant difference from the result on PMMA surface (p < 0.05).